Igor Melnyk1*, Vitaliy Melnyk2, Serhii Tuhai1, Iryna Shved1, Dmytro Kovalchuk3
1National Technical University of Ukraine “Igor Sikorsky Kyiv Polytechnic Institute”, Electronic Faculty, Electronic Devices and Systems Department, Kyiv, Ukraine
2National Technical University of Ukraine “Igor Sikorsky Kyiv Polytechnic Institute”, Institute of Electronics and Microsystem Technique, Kyiv, Ukraine
3Joint Stock Company, Scientific and Industrial Association “Chervona Hvylia”, Kyiv, Ukraine
*Corresponding author: Igor Melnyk, National Technical University of Ukraine “Igor Sikorsky Kyiv Polytechnic Institute”, Electronic Faculty, Electronic Devices and Systems Department, Kyiv, Ukraine. e-mail: [email protected]
Citation: Melnyk I. (2022). The Mathematical Model of Arc Discharge in Metal Vapors at Active Gases over Crucible for Technological Process of Electron Beam Deposition of Ceramic Coatings. Nanoparticle 3(1):7.
Received : December 4, 2021
Published : January 10, 2022
Copyright: Melnyk I. © (2022).
The mathematical model of arc discharge in the metal vapors, propagated in the soft vacuum in the medium of active gases, is presented in this chapter. Such type of discharge is widely used in advanced electron beam technologies for obtaining the coating of new types from nanostructurized materials, especially ceramics coating. As electron beam sources for evaporation of refractory metals in this technological process the high voltage glow discharge electron guns are widely and effectively used. But the aim of applying of additional low-voltage arc discharge under the crucible is stimulating and maintaining the chemical reactions between metal vapors and residual gas in the vacuum technological chamber. In formed model for calculation of electric field distribution the analytical solving of Poisson equation is used, and the spatial distribution of discharge current density is defined on the base of the equation of uncontineously of electrons and ions flows. All analytical relations for auxiliary geometry of electrodes system with cylindrical crucible and ring electrode with positive potential over it have been obtained. Such electrodes system is standard for electron beam installations, designed to deposition of chemically complex ceramic coatings. The simulation results shown, that for power of electron beam range of nearly 10 kW and greater, the pressure in technological chamber range of few Pa and potential on electrode, located over crucible, 70 – 100 V, the current density of arc discharge is in range 0.05 – 0.1 А/cm2 . Such value of current density is generally enough to maintaining the chemical reaction between the metal vapors and active gas for obtaining the nanostructurized coatings with good steheometry. Obtained simulation results may be interesting to experts on applying of electron beam technologies for obtaining different types of nanostructurized ceramics coatings.
Keywords: Physical Vapor Deposition, Reactive Evaporation, Nanostructurized Ceramics Coatings, Electron Beam Evaporation, Arc Discharge, High Voltage Glow Discharge, Residual Gas.